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Chemistry / Matter / Manufacturing / Ceramic materials / Semiconductor device fabrication / Thin film deposition / Plasma processing / Anions / Chemical vapor deposition / Silicon nitride / Silicon dioxide / Plasma-enhanced chemical vapor deposition


www.afm-journal.de www.MaterialsViews.com Seung-Kyun Kang, Suk-Won Hwang, Huanyu Cheng, Sooyoun Yu, Bong Hoon Kim, Jae-Hwan Kim, Yonggang Huang, and John A. Rogers*
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Document Date: 2014-07-22 13:23:02


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File Size: 1,20 MB

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