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MOSFET / Threshold voltage / Field-effect transistor / Depletion region / Transistor / Electronic design / Semiconductors / Electrical engineering / Technology / Electronic engineering


1 Analytical Results for the I-V Characteristics of a Fully Depleted SOI-MOSFET H. Morris, E. Cumberbatch, V. Tyree, H. Abebe Abstract: Explicit formulae for the I-V characteristics of an SOI/SOS MOSFET operating in the
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Document Date: 2006-06-15 18:19:28


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City

New York / Marina Del Rey / /

Company

Computational Electronics / McGraw-Hill Book Company / T. C. Hsiao N. A. / /

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Facility

University of Southern California / Information Sciences Institute / San Jose State University / /

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IndustryTerm

intrinsic carrier concentration charge / long and short channel devices / simulation tool / asymptotic solution / semiconductor devices / analytical solutions / nano scale devices / SPICE software / metal oxide semiconductor field effect transistor / important evolution in device / half micrometer technology / short channel device / long channel device / enough applications / /

OperatingSystem

Fermi / /

Organization

Graduate School / Information Sciences Institute / University of Southern California / Department of Mathematics / San Jose State University / San Jose / /

Person

J. Kervorkian / John Wiley / E. Cumberbatch / V / Rey / /

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Position

semi-conductor / /

ProvinceOrState

Southern California / New York / /

Region

Southern California / /

Technology

semiconductor / SOI technologies / a half micrometer technology / a half micrometer SOS technology / semiconductor devices / dielectric / simulation / /

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