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Semiconductor device fabrication / Microtechnology / Logic families / Silicon on insulator / Integrated circuit / CMOS / Wafer / Soitec / 32 nanometer / Electronics / Electronic engineering / Materials science


PROJECT RESULT IC technology integration T206: CMOS SOI for low power logic and
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Document Date: 2009-03-25 10:39:38


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City

Paris / /

Company

IBM / Philips Semiconductors / Infineon Technologies / STMicroelectronics / /

Continent

Europe / /

Country

United States / /

/

Facility

DAM CEA-LETI CISSOID ETH Zurich Freescale Semiconductors IEMN IMEP Infineon Technologies NXP / /

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IndustryTerm

nm products / multiband systems / ance applications / ultra low power applications / technology integration / nm applications / low voltage/low power applications / volume products / parasitic bipolars applications / electronics / high speed computing / thin junctions ume applications / analogue applications / computing / wafers ance applications / /

Organization

Information Society / The Netherlands Sweden Switzerland EUREKA MEDEA+ Office / /

Person

Eugene Mackowiak / /

/

Position

PROJECT LEADER / leader / co-operative / /

PublishedMedium

the Information Society / /

Technology

bulk CMOS technology / ilicon-on-insulator CMOS technology / also producing performance CPU chips / key technology / SOI technology / mobile phones / RF technology / GSM / SRAM / SOI-based chips / integrated circuit / /

URL

http /

SocialTag