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Materials science / Microtechnology / Polymers / LIGA / Photoresist / SU-8 photoresist / X-ray lithography / Poly / Resist / X-ray / Microelectromechanical systems / HARMST


Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,*, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom
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Document Date: 2012-08-02 10:05:16


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