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Silicon monoxide / Silicon compounds / Anions / Silicide


Photon Factory Activity Report 2006 #24 Part BSurface and Interface 18A/ 2006G007 Thickness-dependent electronic structure of Dy silicide films grown
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Document Date: 2010-01-05 10:33:39


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Country

Japan / /

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Facility

University of Tokyo / The Institute / Chiba University / Tohoku University / /

IndustryTerm

energy range / device applications / /

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Fermi / /

Organization

Department of Physics / University of Tokyo / Institute for Solid State Physics / Tohoku University / Sendai / Graduate School / Chiba University / /

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