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Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan
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Document Date: 2009-05-08 06:50:23
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Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan