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SU-8 photoresist
Results: 17

#	Item
1	Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD) Add to Reading List Source URL: camd.lsu.edu Language: English - Date: 2012-07-31 11:19:10 Chemistry Microtechnology Materials science Engineering Polymers LIGA Semiconductor device fabrication Microelectromechanical systems Photoresist Photolithography SU-8 photoresist Poly
2	Microsoft Word - exposure_request_form.dot Add to Reading List Source URL: camd.lsu.edu Language: English - Date: 2009-01-29 10:14:22 Chemistry Materials science Polymers Polymer chemistry SU-8 photoresist Resist Microtechnology
3	Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD) Add to Reading List Source URL: www.camd.lsu.edu Language: English - Date: 2012-07-31 11:19:10 Chemistry Microtechnology Materials science Polymers LIGA Semiconductor device fabrication Microelectromechanical systems Photoresist Photolithography SU-8 photoresist Poly Resist
4	SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b Add to Reading List Source URL: www.camd.lsu.edu Language: English - Date: 2012-08-02 10:13:02 Chemistry Materials science Microtechnology Matter Polymers Semiconductor device fabrication Electrical engineering SU-8 photoresist LIGA Microelectromechanical systems Photoresist Resist
5	SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b Add to Reading List Source URL: camd.lsu.edu Language: English - Date: 2012-08-02 10:13:02 Chemistry Materials science Microtechnology Matter Polymers Semiconductor device fabrication Electrical engineering SU-8 photoresist LIGA Microelectromechanical systems Photoresist Resist
6	Microsoft Word - exposure_request_form.dot Add to Reading List Source URL: www.camd.lsu.edu Language: English - Date: 2009-01-29 10:14:22 Chemistry Materials science Polymers Polymer chemistry SU-8 photoresist Resist
7	FABRICATION OF 3D POLYMER-METAL NANO-COMPOSITES IN A SINGLE STEP BY TWO-PHOTON INDUCED POLYMERISATION AND METAL SALT REDUCTION Qin Hu, Yaan Liu, Yinfeng He, Fan Zhang, Ricky Wildman, Chris Tuck and Richard Hague EPSRC C Add to Reading List Source URL: sffsymposium.engr.utexas.edu Language: English* - Date: 2015-09-23 15:09:44 Materials science Chemistry Metamaterials Nanomaterials Optics Technology Microtechnology Plasmonic metamaterial SU-8 photoresist Nanolithography Nanoparticle 3D microfabrication
8	Opportunities for SUEX dry laminate resist in microfluidic MEMS applications Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b Add to Reading List Source URL: camd.lsu.edu Language: English - Date: 2012-07-20 11:49:34 Materials science Microtechnology Polymers Electrical engineering Nanotechnology LIGA Microelectromechanical systems Photoresist Microfluidics SU-8 photoresist Resist Printed circuit board
9	Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom Add to Reading List Source URL: www.camd.lsu.edu Language: English* - Date: 2012-08-02 10:05:16 Materials science Microtechnology Polymers LIGA Photoresist SU-8 photoresist X-ray lithography Poly Resist X-ray Microelectromechanical systems HARMST
10	Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Add to Reading List Source URL: www.camd.lsu.edu Language: English* - Date: 2012-08-02 10:08:48 Materials science Microtechnology Polymers Semiconductor device fabrication X-ray lithography Photolithography LIGA SU-8 photoresist Photoresist Nanolithography Beamline Electron-beam lithography