High-purity copper applications Sputtering targets, anodes and pellets Precision without compromise Luvata is a specialist in the refining and fabrication of high-purity copper for PVD

Source URL: www.luvata.com

CONSIGLIO NAZIONALE DELLE RICERCHE Characterization of Titanium Dioxide thin films produced by RF plasma sputtering technique for photocatalytic applications F. Inzoli1, G. Angella2, R. Caniello1, M. Canetti3

Source URL: www.ifp.cnr.it

FRA UNHO F ER I NSTIT U T E F OR OR G A N IC E L E C TRON ICS, ELECTRON BEA M A N D PLA SM A TECH N OLOGY FEP i-P ULSE ® PULSED POWER SUPPLY FOR PULSE MAGNETRON SPUTTERING IN UNIPOLAR/BIPOLAR/PULSE PACKAGE MODES

Source URL: www.fep.fraunhofer.de

Microbial pathogens and strategies for combating them: science, technology and education (A. Méndez-Vilas, Ed.) ____________________________________________________________________________________________ Cu, Cu/TiO2 th

Source URL: www.formatex.info

• Chemical elements
• Electrical conductors
• Transition metals
• Sputter deposition
• Sputtering
• Nanocomposite
• Bacteria
• Thin film
• Zinc oxide
• Chemistry
• Coatings
• Materials science

Experimental studies of First mirror exposure and surface recovery on EAST Rong Yan, Rui Ding, Junling Chen, Longwei Chen Institute of Plasma Physics, Chinese Academy of Sciences, Hefei, PR China First mirror (FM)

Source URL: psi2014.nifs.ac.jp

• Chemistry
• Optics
• Reflectivity
• Thermodynamics
• Sputter deposition
• Mirror
• Plasma
• Sputtering
• Thin film deposition
• Physics
• Semiconductor device fabrication

UBS-C2 Unipolar/bipolar switching unit for two channel Pulse Magnetron Sputtering Special features

Source URL: www.fep.fraunhofer.de

• Technology
• Electric arcs
• Coatings
• Materials science
• Plasma processing
• Sputter deposition
• Sputtering
• Arc suppression
• Pulse-width modulation
• Electromagnetism
• Electrical discharge in gases
• Electricity

Retention in and release from tungsten materials irradiated by low-energy D

Source URL: www.nifs.ac.jp

• Nuclear physics
• Atomic physics
• Coatings
• Sputtering
• Plasma
• Deuterium
• Emission spectrum
• Flux
• Physics
• Chemistry
• Materials science

APEX Interim Report - Executive Summary for Chapter 12 Executive Summary of Plasma-Interface Issues and Edge Modeling (Sec. 12) A crucial issue for the use of liquid walls in fusion systems is their impact on the perform

Source URL: www.fusion.ucla.edu

• Fusion reactors
• Astrophysics
• Plasma
• Plasma physics
• Sputtering
• Tokamak
• Lithium
• FLiBe
• Lithium Tokamak Experiment
• Chemistry
• Physics
• Matter

Advances in Remote Plasma Sources for Cleaning 300 mm and Flat Panel CVD Systems

Source URL: www.mksinst.com

• Materials science
• Technology
• Plasma etching
• Plasma
• Chemical vapor deposition
• Etching
• Sputtering
• Ion source
• Ultra-high-purity steam for oxidation and annealing
• Semiconductor device fabrication
• Plasma processing
• Chemistry

VON ARDENNE SERVICE LOCATIONS VON ARDENNE GmbH (headquarters) PlattleiteIDRESDEN I GERMANY I E-mail: I Telephone: +9400 VON ARDENNE Vacuum Equipment (Shanghai) Co., Lt

Source URL: www.vonardenne.biz

• Radar
• Coatings
• Sputtering
• Fax
• Technology
• Materials science
• Cavity magnetron